MoNb10 Target
MoNb10 target Basic information of MoNb10 target Chemical composition of MoNb10
Send InquiryIntroduction to MoNb10 Target
Basic Details:
MoNb10 target is a vital part in the field of flimsy film testimony, explicitly used in faltering cycles for slim film creation. This target is made out of an exact combination mix of Molybdenum (Mo) and Niobium (Nb) in a proportion of 90:10, offering excellent execution qualities fundamental for different cutting edge applications.
Product Standards:
Our MoNb10 target is widely recognized for its adherence to rigorous quality standards, guaranteeing unparalleled uniformity, purity, and consistency in every single unit produced. Each stage of the manufacturing process is meticulously executed to ensure that the final product meets or exceeds both industry specifications and customer expectations.
At the heart of our manufacturing process is a commitment to maintaining the highest level of quality control. We employ cutting-edge technologies and advanced techniques to carefully monitor each step, from material selection to final inspection. This meticulous approach guarantees that every product we produce possesses the same exceptional attributes, enabling consistent and reliable performance across various applications.
Basic Parameters:
The MoNb10 target boasts superior physical and chemical properties, including high melting point, excellent thermal conductivity, and exceptional corrosion resistance. These parameters make it an ideal choice for demanding thin-film deposition processes.
Product Attributes:
High purity MoNb10 alloy composition
Uniform grain structure for enhanced sputtering efficiency
Precise dimensions and flatness for consistent film deposition
Excellent thermal stability and mechanical strength
Product Functions:
The primary function of the product is to facilitate the deposition of thin films with exceptional adhesion, uniformity, and quality. It serves as the source material for sputtering processes employed in various semiconductor, optical, and decorative coating applications.
Features:
Superior sputtering performance for thin-film fabrication
High purity and uniform composition ensure reliable results
Robust construction for extended service life
Compatible with a wide range of sputtering systems
Advantages and Highlights:
Exceptional thin-film quality and uniformity
Enhanced productivity and efficiency in thin-film deposition processes
Cost-effective solution for advanced material research and production
Customizable specifications available upon request
Application Areas:
The products find far and wide application in ventures, for example,
Semiconductor fabricating
Optical coatings
Flimsy film sunlight based cells
Attractive capacity media
Beautiful coatings
OEM Service:
We offer far reaching OEM administrations, permitting clients to modify the product as per their particular necessities. Our accomplished group teams up intimately with clients to foster custom-made arrangements that meet their interesting application needs.
FAQ:
Q: What is the purity level of your product? A: Our products typically have a purity of 99.9% or higher, ensuring superior performance and reliability.
Q: Can you provide custom dimensions for the products? A: Yes, we offer custom machining services to provide the products in various shapes and sizes to suit different sputtering systems.
Tungsten & Molybdenum Production Line:
Notwithstanding the products, we work a total tungsten and molybdenum creation line, guaranteeing a solid stock of excellent materials for different modern applications.
Contact Information:
For inquiries or orders, please contact: Email: betty@hx-raremetals.com
Conclusion:
With its excellent presentation, flexibility, and unwavering quality, the products remains as a foundation in slim film testimony processes across different ventures. Supported by our obligation to quality and consumer loyalty, we endeavor to convey state of the art arrangements that meet the advancing necessities of our worldwide customer base.
MoNb10 target
Basic information of MoNb10 target
Product Name | MoNb10 target |
Material | Nb9.2~11.2%,Mo balanced |
Standard | GB |
Sample | Available |
Surface | bright and clean |
Dimension | customized |
Melting point | 2600℃ |
Density | 9.4~9.7g/cm3 |
Product Features | Better corrosion resistance and better adhesion than pure molybdenum,the resistance and stress also better |
Application | Sputtering targets |
Chemical composition of MoNb10
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