Application of Tungsten in Surface Technology Engineering
1. Tungsten evaporation source
Resistance heating is a high-temperature evaporation source. Because of its extremely high melting point, extremely low equilibrium vapor pressure, and very stable chemical properties at high temperatures, tungsten is selected as the emission material to produce evaporation sources of various shapes. Such as filament and spiral tungsten evaporation sources, disk and boat-shaped tungsten evaporation sources.
2. Tungsten sputtering target
Tungsten sputtering targets are usually made of high-purity or ultra-high-purity tungsten. The sputtering process uses gas discharge to generate gas ionization. The positive ions bombard the cathode target (tungsten target) at a high speed under the action of an electric field, and knock out the tungsten atoms of the cathode target and fly to the surface of the deposited atoms to deposit a thin film.
