Tungsten Target

Introduction to Tungsten Target

Basic Details:

Tungsten targets are crucial components utilized in various high-tech applications, particularly in the field of thin film deposition. Renowned for their exceptional durability and high melting point, It play a vital role in sputtering processes, ensuring precise and efficient material deposition onto substrates.

Product Standards:

It adhere to stringent quality standards, ensuring uniformity, purity, and structural integrity. These standards typically include composition requirements, dimensional specifications, and surface finish criteria to meet the exacting demands of modern manufacturing processes.

Basic Parameters:

It are available in various configurations, tailored to specific application requirements. Parameters such as purity level, grain size, dimensions, and surface morphology are carefully optimized to enhance performance and reliability.

Product Attributes:

• Exceptional Durability: It boast remarkable mechanical strength and resistance to thermal and chemical degradation, ensuring prolonged service life even under harsh operating conditions.

• High Purity: It exhibit exceptional purity levels, minimizing contamination and ensuring superior film quality in deposition processes.

• Precise Dimensional Control: It are manufactured with precise dimensional accuracy, facilitating seamless integration into diverse deposition systems for enhanced process efficiency.

• Versatile Compatibility: It are compatible with various sputtering techniques and deposition methods, offering versatility across a wide range of applications.

Product Functions:

Tungsten targets serve as the primary source of material in sputtering processes, where atoms are ejected from the target surface and deposited onto substrates to form thin films with desired properties. This enables the fabrication of advanced coatings and functional layers essential for numerous industrial and technological applications.

Features:

• High Dissolving Point: It display one of the greatest softening focuses among metals, guaranteeing dependability and unwavering quality in high-temperature handling conditions.

• Amazing Warm Conductivity: It have exceptional warm conductivity, working with effective intensity scattering during faltering activities, in this manner limiting warm pressure and improving cycle control.

• Customized Details: It are accessible in different pieces and designs, permitting customization to meet explicit application necessities with accuracy and adaptability

Advantages and Highlights:

• Superior Performance: It deliver unparalleled performance and reliability, making them the preferred choice for demanding thin film deposition applications.

• Enhanced Productivity: It enable high-throughput processing and consistent film quality, contributing to increased productivity and cost-effectiveness in manufacturing operations.

• Extended Service Life: It's exceptional durability and resistance to wear ensure prolonged service life and minimal downtime, resulting in enhanced operational efficiency and reduced maintenance costs.

Application Areas:

Tungsten targets find widespread use across diverse industries, including semiconductor manufacturing, solar cell production, flat panel display fabrication, optical coatings, and magnetic storage media, among others.

OEM Service:

We offer comprehensive OEM services, allowing clients to customize them to their precise specifications, including composition, dimensions, and surface characteristics.Our committed group of specialists teams up intimately with clients to foster custom-made arrangements that meet their novel prerequisites and application needs.

FAQ:

Q: What purity levels are available for them? 

A: They are available in a range of purity levels, typically exceeding 99.95% purity to meet the stringent demands of high-tech applications.

Q: Can it be customized to specific dimensions? 

A: Yes, we offer customization services for it, allowing customers to specify dimensions, shapes, and configurations tailored to their particular deposition systems and process requirements.

Q: Are they compatible with all sputtering techniques? 

A: They are compatible with various sputtering techniques, including DC magnetron sputtering, RF sputtering, and pulsed DC sputtering, offering versatility across different deposition methods and equipment platforms.

Basic Product Parameter Standards:

Contact Information:

For inquiries or orders, please contact us at: betty@hx-raremetals.com

Conclusion:

Tungsten targets address fundamental parts in slight film testimony processes, offering remarkable toughness, immaculateness, and execution across a different scope of cutting edge applications. With our obligation to quality, customization, and consumer loyalty, we endeavor to be your believed accomplice in satisfying your tungsten target needs.

Product name: tungsten target

size:customized

purity:≥99.95%

Application: They are mainly used in aerospace, rare earth smelting, electric light sources, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum, and other fields.

Physical properties:

Density: 19.3g/cm3

Melting point: 3410±20°C

Boiling point: 5927 ° C

Surface: Ground or caustic washing

Advantages:Fine grain, uniform structure, high density

We can provide the following:

High purity tungsten target 99.95, 99.999

High purity molybdenum target 99.95, 99.99

High purity tantalum target 99.95, 99.99

High purity niobium target 99.95, 99.99

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